Number of found documents: 547
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Mechanical properties of plasma sprayed layers of NiAl10 and NiAl40 on AZ91 alloy
Kubatík, Tomáš František; Brodil, R.; Ctibor, Pavel; Průša, F.; Brožek, Vlastimil
2018 - English
In this work, plasma coatings of NiAl10 and NiAl40 on magnesium alloy AZ91 substrate were prepared by the hybrid plasma spraying system WSP®-H 500. The both plasma sprayed coatings of NiAl10 and NiAl40 have metallurgical bond. The thicknesses of microstructures in the cross-section of NiAl10 and NiAl40 plasma sprayed coatings prepared by 9 passes were 374 and 440 μm respectively. Adhesion test of plasma sprayed layers was performed using a modified ASTM C 633 standard. The tensile adhesion strength values are 24.7 MPa for NiAl10 coatings and 12.3 MPa for NiAl40 coatings. Abrasion resistance according to Slurry Abrasion Response (SAR) test of NiAl40 layers had similar values (0.12 g/cm2)in a comparison with the uncoated AZ91 (0.126 g/cm2). Layers NiAl10 had greater weight losses (0.175 g/cm2) than uncoated AZ91. Microhardness of plasma coating of NiAl40 is several times greater than microhardnesses of plasma coating of NiAl10 and uncoated substrate AZ91 Keywords: Adhesion strength; Nickel alloys; Plasma spraying; Wear resistance Available at various institutes of the ASCR
Mechanical properties of plasma sprayed layers of NiAl10 and NiAl40 on AZ91 alloy

In this work, plasma coatings of NiAl10 and NiAl40 on magnesium alloy AZ91 substrate were prepared by the hybrid plasma spraying system WSP®-H 500. The both plasma sprayed coatings of NiAl10 and ...

Kubatík, Tomáš František; Brodil, R.; Ctibor, Pavel; Průša, F.; Brožek, Vlastimil
Ústav fyziky plazmatu, 2018

Study on polishing of ZnSe with diamond suspension
Procháska, František; Thoř, Tomáš
2018 - English
Keywords: ZnSe polishing; Diamond polishing slurry Available at various institutes of the ASCR
Study on polishing of ZnSe with diamond suspension

Procháska, František; Thoř, Tomáš
Ústav fyziky plazmatu, 2018

Zajištění plošné homogenity při depozici složitých systémů vrstev
Žídek, Karel
2018 - Czech
V této zprávě popisujeme postup optimalizace depozice interferenčního filtru s cílem dosáhnout homogenní tloušťky vrstvy na co největším rozsahu deponované plochy. Za použití depoziční masky a rotace depoziční kaloty dosahujeme homogenity ± 0.5% pro vzorky do průměru 5 cm. Zkoumáme poté vliv naklonění substrátu a depozici na zakřivený povrch čočky na homogenitu deponované vrstvy. We report on a procedure of optimization of a thin-film deposition process with respect to the best attainable layer homogeneity on a large deposited surface. By using a deposition mask and rotation of the deposition calotte, we reach the homogeneity of ± 0.5% for samples with the diameter up to 5 cm. Furthermore, we investigate the effect of substrate tilt and of a deposition on a curved lens surface with respect to homogeneity of the deposited layer. Keywords: thin layer deposition; deposition mask; surface homogeneity Available at various institutes of the ASCR
Zajištění plošné homogenity při depozici složitých systémů vrstev

V této zprávě popisujeme postup optimalizace depozice interferenčního filtru s cílem dosáhnout homogenní tloušťky vrstvy na co největším rozsahu deponované plochy. Za použití depoziční masky a rotace ...

Žídek, Karel
Ústav fyziky plazmatu, 2018

Application of Electric Probes for Study of Structure of Thermal Plasma Jet.
Hurba, Oleksiy; Hrabovský, Milan
2017 - English
Thermal plasma at atmospheric pressure was investigated. Electric probes and doable probe used as relatively simple and efficient tool for diagnostic of structure of flow field in thermal plasma jet. Were defined plasma potential and boundaries of the conducting region and their changing for the diferent operating modes of plasma torch. Keywords: Electric probes; double probe; thermal; plasma jet Available at various institutes of the ASCR
Application of Electric Probes for Study of Structure of Thermal Plasma Jet.

Thermal plasma at atmospheric pressure was investigated. Electric probes and doable probe used as relatively simple and efficient tool for diagnostic of structure of flow field in thermal plasma jet. ...

Hurba, Oleksiy; Hrabovský, Milan
Ústav fyziky plazmatu, 2017

Simulace zbytkových optických vad objektivu Merz 124/1477
Rail, Zdeněk; Melich, Zbyněk; Šrajer, Bohdan
2017 - Czech
Tento objektiv byl na Ústavu fyziky plazmatu,v.v.i., Centru Toptec v Turnově restaurován. Během tohoto procesu jsme získali možnost objektiv na optické lavici přeměřit a vyčíslit jeho zbytkové optické vady. Objektiv byl vyroben kolem roku 1860-1870. This objective lens was renoved in the Institute of Plasma Physics, v.v.i. Center Toptec in Turnov. During the process we got a possibility to measure the objective lens on the optical bench and to evaluate its residual optical aberrations. The objective lens was manufactured in 1860-1870 years Keywords: Achromatic dublet; spherochromatic aberration; coma; dispersion curve of glass; B-F chromatic correction Available at various institutes of the ASCR
Simulace zbytkových optických vad objektivu Merz 124/1477

Tento objektiv byl na Ústavu fyziky plazmatu,v.v.i., Centru Toptec v Turnově restaurován. Během tohoto procesu jsme získali možnost objektiv na optické lavici přeměřit a vyčíslit jeho zbytkové optické ...

Rail, Zdeněk; Melich, Zbyněk; Šrajer, Bohdan
Ústav fyziky plazmatu, 2017

Optické parametry význačných refraktorů
Rail, Zdeněk; Jareš, Daniel; Pintr, Pavel; Vápenka, David
2017 - Czech
V tomto referátu publikujeme optické parametry několika historických dalekohledů, které jsme v literatuře a na webových stránkách získali. Data byla vložena do optického programu ZEMAX, v němž byly vyčísleny jejich zbytkové vady. In this paper we publish the optical parameters of several historic telescopes, which we have found in scientific literature or web pages. Data were inputed into the optical program ZEMAX, which evaluated their residual aberrations. Keywords: Achromatic objective lens; spherochromatic aberration; coma; residual chromatic aberration; Index of refraction; dispersion curve of glass Available at various institutes of the ASCR
Optické parametry význačných refraktorů

V tomto referátu publikujeme optické parametry několika historických dalekohledů, které jsme v literatuře a na webových stránkách získali. Data byla vložena do optického programu ZEMAX, v němž byly ...

Rail, Zdeněk; Jareš, Daniel; Pintr, Pavel; Vápenka, David
Ústav fyziky plazmatu, 2017

Sub-Nanosecond Laser Induced Plasma as Water Window Radiation Source.
Vrbová, M.; Vrba, Pavel
2017 - English
Laser plasma created in a krypton gas puff target is studied as a source of radiation in the water window spectral range (lambda= 2.3 - 4.4 nm). The spatial development of the plasma induced by a sub-nanosecond Nd:YAG laser pulse focused on the gas puff target is modeled using 2d RMHD code Z*. Space-time distributions of plasma quantities, namely electron temperature, electron density, mass density and plasma expansion velocity were evaluated. Instantaneous spectra during the laser pulse and during plasma decay period are also calculated. Temporal evolutions of the krypton ions relative populations prove that ions from Kr21+ and Kr22+ are responsible for dominant spectral intensity emitted at a wavelength around lambda= 3 nm. Evaluated time resolved spectra are compared with time integrated spectra obtained experimentally. Keywords: RMHD simulations; gas puff; laser plasma water window sources Available at various institutes of the ASCR
Sub-Nanosecond Laser Induced Plasma as Water Window Radiation Source.

Laser plasma created in a krypton gas puff target is studied as a source of radiation in the water window spectral range (lambda= 2.3 - 4.4 nm). The spatial development of the plasma induced by a ...

Vrbová, M.; Vrba, Pavel
Ústav fyziky plazmatu, 2017

Deformation of thin self-standing mask at inhomogeneous irradiation.
Koláček, Karel; Schmidt, Jiří; Frolov, Oleksandr; Štraus, Jaroslav; Chalupský, Jaromír; Choukourov, A.
2017 - English
Flatness of the mask is one of key features influencing the quality of image. Among factors that can affect mask flatness belongs inhomogeneous illumination. This does not apply to lithography, but to experiments that use only discrete parts of mask e.g. for nanostructuring or other type of material research. It is shown that even single EUV laser shot (laser wavelength ~46.9 nm, pulse duration ~1.5 ns, focused pulse energy ~20 .mu.J, peak fluency 48 J/cm2) not only deforms the mask, but also changes mask-substrate distance. In our case two kinds of grids (one circular with rectangular windows 7.5x7.5 μm and bars 5 micro m (period 12.5x12.5 micro m), other rectangular with rectangular windows 3.2x1.2 μm and bars 0.8 micro m (period 4x2 micro m)) were attached to PMMA substrate and exposed to one or five superimposed focused laser shots. The mask (grid) deformation was inferred from the changes of diffraction pattern engraved into PMMA. Keywords: interaction of XUV radiation with solid surface; nanostructuring; nanopatterning; XUV diffraction Available at various institutes of the ASCR
Deformation of thin self-standing mask at inhomogeneous irradiation.

Flatness of the mask is one of key features influencing the quality of image. Among factors that can affect mask flatness belongs inhomogeneous illumination. This does not apply to lithography, but to ...

Koláček, Karel; Schmidt, Jiří; Frolov, Oleksandr; Štraus, Jaroslav; Chalupský, Jaromír; Choukourov, A.
Ústav fyziky plazmatu, 2017

The role of pre-ionization on EUV capillary laser profile.
Štraus, Jaroslav; Schmidt, Jiří; Koláček, Karel; Frolov, Oleksandr
2017 - English
The profile of EUV capillary laser beam was believed to be an annulus and a corresponding theory for its explanation was generally accepted. Nevertheless, our recent detailed observation shows, that the laser profile can be remarkably influenced by the parameters of pre-pulse, serving for working gas pre-ionisation before introduction the main current into the capillary. The examples of possible profile shapes and corresponding parameters are presented. Keywords: Pre-pulse; capillary XUV laser beam profile Available at various institutes of the ASCR
The role of pre-ionization on EUV capillary laser profile.

The profile of EUV capillary laser beam was believed to be an annulus and a corresponding theory for its explanation was generally accepted. Nevertheless, our recent detailed observation shows, that ...

Štraus, Jaroslav; Schmidt, Jiří; Koláček, Karel; Frolov, Oleksandr
Ústav fyziky plazmatu, 2017

Material design problems of plasma-chemical reactors for disposal perfluorinated compounds
Brožek, Vlastimil; Březina, Václav; Mastný, L.; Kubatík, Tomáš František; Živný, Oldřich
2017 - English
Reduction of perfluorinated gases emissions from semiconductor industry has recently introduced a serious problem from both technological and economic side. With respect to chemistry of the decomposition reactions the most effective abatement techniques developed up to now consists in the interaction of those gaseous pollutants with several types of plasmas. In the framework of Czech-Taiwanese bilateral project No. 17-10246J 'Decomposition of Perfluorinated Compounds and Fluorinated Ozone Depleting Substances' a new plasmochemical reactor design is to be solved. In this reactor the plasma abatement process consisting of interaction of the plasma generated by unique watter stabilized H-WSP plasma torch at temperatures ranging\nfrom 2000 K up to 25,000 K with the treated gases will be carried out. However, the main product generated in the reactor during the steam plasma abatement process is hydrogen fluoride which causes corrosion of almost every construction material. The aim pursued by the work presented is to search for the materials resistant to exposition of HF even at high temperatures. To investigate corrosion resistance of construction materials with thermal stability within temperature interval 2700-3000 °C titan nitride, boron nitride, and silicon carbide have been selected. The samples of those materials have been prepared by spark plasma sintering method and exposed to concentrated solution of hydrofluoric acid for which corrosion rates have been measured Keywords: perfluorinated compounds; thermal plasma torch; boron nitride; titanium nitride; silicon carbide Available at various institutes of the ASCR
Material design problems of plasma-chemical reactors for disposal perfluorinated compounds

Reduction of perfluorinated gases emissions from semiconductor industry has recently introduced a serious problem from both technological and economic side. With respect to chemistry of the ...

Brožek, Vlastimil; Březina, Václav; Mastný, L.; Kubatík, Tomáš František; Živný, Oldřich
Ústav fyziky plazmatu, 2017

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