Název: Relation between optical and microscopic properties of hydrogenated silicon thin films with integrated germanium and tin nanoparticles
Autoři: Stuchlík, Jiří ; Stuchlíková, The-Ha ; Čermák, Jan ; Kupčík, Jaroslav ; Fajgar, Radek ; Remeš, Zdeněk
Typ dokumentu: Příspěvky z konference
Konference/Akce: NANOCON 2018 -International Conference on Nanomaterials - Research and Application /10./, Brno (CZ), 20181017
Rok: 2019
Jazyk: eng
Abstrakt: The hydrogenated amorphous silicon layers (a-Si:H) were deposited by PECVD method on quartz substrates. During interruption of PECVD process the vacuum chamber was pumped up to 10-5 Pa and 1 nm thin films of Germanium or Tin were evaporated on the surface. The materials form isolated nanoparticles (NPs) on the a-Si:H surface. Then the deposited NPs were covered and stabilized by a-Si:H layer by PECVD. Those two deposition processes were alternated 5 times. The a-Si:H thin films with integrated Ge or Sn NPs were characterized optically by PDS and CPM methods, and microscopically by SEM and AFM microscopies. Optical and microscopic properties of the structures are correlated and discussed considering their application in photovoltaics.\n
Klíčová slova: a-Si:H; germanium; nanoparticles; thin films; tin
Číslo projektu: CZ.02.1.01/0.0/0.0/16_019/0000760, EF16_019/0000760, LTC17029, GC16-10429J (CEP)
Poskytovatel projektu: OP VVV - SOLID21, GA MŠk, GA MŠk, GA ČR
Zdrojový dokument: NANOCON 2018 : Conference Proceedings of the International Conference on Nanomaterials - Research & Application /10./, ISBN 978-80-87294-89-5

Instituce: Fyzikální ústav AV ČR (web)
Informace o dostupnosti dokumentu: Dokument je dostupný v repozitáři Akademie věd.
Původní záznam: http://hdl.handle.net/11104/0307159

Trvalý odkaz NUŠL: http://www.nusl.cz/ntk/nusl-410814


Záznam je zařazen do těchto sbírek:
Věda a výzkum > AV ČR > Fyzikální ústav
Konferenční materiály > Příspěvky z konference