Number of found documents: 976
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Nanopatterning of Silicon Nitride Membranes
Matějka, Milan; Krátký, Stanislav; Řiháček, Tomáš; Kolařík, Vladimír; Chlumská, Jana; Urbánek, Michal
2017 - English
Membranes are typically created by a thin silicon nitride (SIN) layer deposited on a silicon wafer. Both, top and bottom side of the wafer is covered by a thin layer of the silicon nitride. The principle of silicon nitride membranes preparation is based on the wet anisotropic etching of the bottom side of the silicon wafer with crystallographic orientation (100). While the basic procedure for the preparation of such membranes is well known, the nano patterning of thin membranes presents quite important challenges. This is partially due to the mechanical stress which is typically presented within such membranes. The resolution requirements of the\nmembrane patterning have gradually increased. Advanced lithographic techniques and etching procedures had to be developed. This paper summarizes theoretical aspects, technological issues and achieved results. The application potential of silicon nitride membranes as a base for multifunctional micro system (MMS) is also\ndiscussed. Keywords: e-beam writer; silicon nitride membranes; nano patterning; anisotropic etching Available at various institutes of the ASCR
Nanopatterning of Silicon Nitride Membranes

Membranes are typically created by a thin silicon nitride (SIN) layer deposited on a silicon wafer. Both, top and bottom side of the wafer is covered by a thin layer of the silicon nitride. The ...

Matějka, Milan; Krátký, Stanislav; Řiháček, Tomáš; Kolařík, Vladimír; Chlumská, Jana; Urbánek, Michal
Ústav přístrojové techniky, 2017

Vliv aktuní dávky a chronického podání olanzapinu na funkční změny mozku u potkana
Dražanová, Eva; Rudá-Kučerová, J.; Krátká, Lucie; Horská, K.; Kotolová, H.; Štark, T.; Babinská, Z.; Micale, V.; Starčuk jr., Zenon
2017 - Czech
Olanzapin patří do skupiny atypických antipsychotik a běžně se používá při terapii schizofrenie. Zaměřili jsme se na změny perfuze mozkové tkáně u zdravých a MAM upravených zvířat. Detekovali jsme významně nižší prokrvení mozkové kůry při akutních a chronických olanzapinem léčených zvířat. Olanzapine belongs to the first choice drug in treatment of schizophrenia. We focused on blood perfusion changes inducted by acute and chronic application of olanzapine in healthy animals and MAM altered animals. We detectet significant lower perfusion of cerebral cortex in acute and chronic olanzapine treated animals. We susspect that it could be due to altered neurotransmiter regulation caused by olanzapine. Keywords: olanzapine; ASL; MAM Available at various institutes of the ASCR
Vliv aktuní dávky a chronického podání olanzapinu na funkční změny mozku u potkana

Olanzapin patří do skupiny atypických antipsychotik a běžně se používá při terapii schizofrenie. Zaměřili jsme se na změny perfuze mozkové tkáně u zdravých a MAM upravených zvířat. Detekovali jsme ...

Dražanová, Eva; Rudá-Kučerová, J.; Krátká, Lucie; Horská, K.; Kotolová, H.; Štark, T.; Babinská, Z.; Micale, V.; Starčuk jr., Zenon
Ústav přístrojové techniky, 2017

Parameter Optimization of Multi-Level Diffraction Gratings
Matějka, Milan; Kolařík, Vladimír; Horáček, Miroslav; Král, Stanislav
2017 - English
Originally, the e-beam lithography (EBL) is a technique for creating high-resolution black and white masks for the optical lithography. Multi-level relief structures can be also prepared using EBL patterning. Their preparation is based on the image patterning with a gradient of exposure doses. Large-area multi-level structures can be effectively prepared using the electron beam pattern generator with a variable shaped beam. We present several writing strategies. Basically, the main writing strategy uses one stamp (i.e. one elementary exposure of the shaped electron beam) per one elementary area with the same exposure dose. This simple approach is fast and flexible, however it does not guarantee optimal results. The main problem is an imperfection of the stamps (size, shape, and homogeneity). Advanced algorithms are based on multiple\nexposure of the same elementary area, the total local exposure dose is a sum of several different elementary exposures (stamps). Using these algorithms, a smoother surface of the structure can be achieved. On the other hand, the writing speed is considerably decreased. Tradeoff between the achieved parameters and the writing speed is discussed for selected set of writing strategy algorithms. Keywords: e-beam pattern generator; variable shaped beam; grayscale lithography; multi-level grating Available at various institutes of the ASCR
Parameter Optimization of Multi-Level Diffraction Gratings

Originally, the e-beam lithography (EBL) is a technique for creating high-resolution black and white masks for the optical lithography. Multi-level relief structures can be also prepared using EBL ...

Matějka, Milan; Kolařík, Vladimír; Horáček, Miroslav; Král, Stanislav
Ústav přístrojové techniky, 2017

Phyllotactic Model Linking Nano and Macro World
Horáček, Miroslav; Meluzín, Petr; Krátký, Stanislav; Urbánek, Michal; Bok, Jan; Kolařík, Vladimír
2017 - English
Recently, the arrangement of diffraction primitives according to a phyllotactic model was presented. This arrangement was used to benchmarking purposes of the e-beam writer nano patterning. The phyllotactic arrangement has several interesting properties. One of them is related with the coherence between the nanoor microscopic domain of individual optical primitives and the properties of visually perceived images crated by these structures in the macro domain. This paper presents theoretical analysis of the phyllotactic arrangement in the referred context. Different approaches enabling the creation of diffractive optically variable images are proposed. The practical part of the presented work deals with the nano patterning of such structures using two different types of the e-beam pattern generators. One of them is a system with a variable shaped beam of electrons, while the other one is a system with a Gaussian-shaped beam. E-beam writing strategies and the use of inherent spiral patterns for exposure ordering and partitioning are also discussed. Keywords: nano patterning; spiral grating structure; phyllotactic pattern; e-beam writer Available at various institutes of the ASCR
Phyllotactic Model Linking Nano and Macro World

Recently, the arrangement of diffraction primitives according to a phyllotactic model was presented. This arrangement was used to benchmarking purposes of the e-beam writer nano patterning. The ...

Horáček, Miroslav; Meluzín, Petr; Krátký, Stanislav; Urbánek, Michal; Bok, Jan; Kolařík, Vladimír
Ústav přístrojové techniky, 2017

Nežádoucí metabolické účinky aripiprazolu v poly I:C modelu schizofrenie u potkana
Horská, K.; Rudá-Kučerová, J.; Dražanová, Eva; Pistovčáková, J.; Karpíšek, M.; Kotolová, H.; Demlová, R.; Kašpárek, T.
2017 - English
The aim of this study was to evaluate metabolic phenotype of poly I:C rat model and asses metabolic effects of chronic aripiprazole treatment with regard to complex neuroendocrine regulations of energy homeostasis. Altered lipid profile in poly I:C model was observed. Leptin and GLP-1 serum levels were significantly reduced, while ghrelin level was elevated. Our data indicate that dysregulation of adipose tissue endocrine function and gastrointestinal hormones is implicated in metabolic adverse effects of antipsychotics. Keywords: metabolic syndrome; aripiprazole; rat; poly I:C animal model Available at various institutes of the ASCR
Nežádoucí metabolické účinky aripiprazolu v poly I:C modelu schizofrenie u potkana

The aim of this study was to evaluate metabolic phenotype of poly I:C rat model and asses metabolic effects of chronic aripiprazole treatment with regard to complex neuroendocrine regulations of ...

Horská, K.; Rudá-Kučerová, J.; Dražanová, Eva; Pistovčáková, J.; Karpíšek, M.; Kotolová, H.; Demlová, R.; Kašpárek, T.
Ústav přístrojové techniky, 2017

Structural Colors of Self-Similar Nano Patterns
Meluzín, Petr; Horáček, Miroslav; Krátký, Stanislav; Kolařík, Vladimír
2017 - English
E-beam lithography is a flexible technology for various diffraction gratings origination. The e-beam patterning typically allows for the creation of optical diffraction gratings in the first diffraction order. However, the very high resolution enables also the patterning of structures providing the zero-order diffraction. Recently, we presented a work on the structural colors of metallic layers covering both regular-line structures and CGH (computer generated hologram) structures. This work presents a study dealing with zero-order diffraction structures with self-similar properties. The practical part of the work is focused on two aspects: design parameters and technological issues. Variations in design parameters include the tone of the structure (positive or negative),\nthe density of filling, the filling factor, and the depth of the structures. The achieved gamut of colors may by primarily extended by the proper selection of metal deposition technology and its parameters, and further by the proper selection of the metal and the thickness of its layer; these are the technological issues. Keywords: e-beam writer; nano patterning; self similarity; diffraction grating Available at various institutes of the ASCR
Structural Colors of Self-Similar Nano Patterns

E-beam lithography is a flexible technology for various diffraction gratings origination. The e-beam patterning typically allows for the creation of optical diffraction gratings in the first ...

Meluzín, Petr; Horáček, Miroslav; Krátký, Stanislav; Kolařík, Vladimír
Ústav přístrojové techniky, 2017

Blaze Gratings with a Ribbed Back Slope
Krátký, Stanislav; Meluzín, Petr; Horáček, Miroslav; Kolařík, Vladimír; Matějka, Milan; Chlumská, Jana; Král, Stanislav
2017 - English
Binary relief phase-modulated gratings provide symmetrical diffraction of the incoming light beam. Asymmetrical gratings, e.g. asymmetrical triangular blazed gratings, are characteristic by an asymmetrical diffraction behavior, where one of the first diffraction orders is more important than the other one. Electron beam lithography is a suitable and flexible tool for patterning of such kind of gratings. High quality results can be readily obtained when the period of the grating is relatively large and the relief depth is relatively low, this is the case of gratings with a small blaze angle. As the blaze angle increases, the quality of result suffers from several patterning-related issues. One of the problems is a reflection of the incoming light beam from the back slope (anti-blaze facet) of the blaze grating. We propose a novel configuration, with a ribbed modulation of the back slope. This modulation is perpendicular to the direction of the grating grooves. This paper presents an analysis of the proposed blazed grating configuration. E-beam pattern generators were used to prepare a few\nsamples of blaze gratings with a ribbed back slope. One part of the experiment was performed with a Gaussianshaped beam and another one with the variable-shaped beam. Results of the experiment are presented.\nFinally, we discuss the optical performance of two blaze gratings with similar parameters, one of them is with the flat back slope and another one is with the ribbed back slope. Keywords: nano patterning; blazed diffraction grating; Gaussian-type beam; variable-shaped beam; electron beam writer Available at various institutes of the ASCR
Blaze Gratings with a Ribbed Back Slope

Binary relief phase-modulated gratings provide symmetrical diffraction of the incoming light beam. Asymmetrical gratings, e.g. asymmetrical triangular blazed gratings, are characteristic by an ...

Krátký, Stanislav; Meluzín, Petr; Horáček, Miroslav; Kolařík, Vladimír; Matějka, Milan; Chlumská, Jana; Král, Stanislav
Ústav přístrojové techniky, 2017

SMV-2016-20: Výpočty detekčních systémů rastrovacích elektronových mikroskopů
Radlička, Tomáš; Oral, Martin; Rozbořil, Jakub
2016 - Czech
V rámci smluvního výzkumu byly analyzovány detekční systémy několika rastrovacích elektronových mikroskopů z portfolia FEI Czech Republic, pro velké množství nastavení systému. Cílem bylo jednak zmapovat detekční mechanizmy, ale také nalézt optimální nastavení systému pro detekci zvolené části spektra signálních elektronů, tak aby se maximalizoval materiálový, nebo topografický kontrast. The analysis of the detection system of scanning electron microscopes produced by FEI Czech Republic was done for many setting of the electron optical system. The main goal was to analyze the detection mechanisms and to find optimal system setting for detection of the given part of signal electron spectrum. It is used for maximization of the material or topographical contrast. Keywords: electron optics; electron microscopy; contrast optimization Available at various institutes of the ASCR
SMV-2016-20: Výpočty detekčních systémů rastrovacích elektronových mikroskopů

V rámci smluvního výzkumu byly analyzovány detekční systémy několika rastrovacích elektronových mikroskopů z portfolia FEI Czech Republic, pro velké množství nastavení systému. Cílem bylo jednak ...

Radlička, Tomáš; Oral, Martin; Rozbořil, Jakub
Ústav přístrojové techniky, 2016

SMV-2016-21: DA modul pro EOD
Radlička, Tomáš
2016 - Czech
V rámci smluvního výzkumu byla vyvinuta softwarová knihovna, která umožňuje užití metody diferenciálních algeber v programu EOD. Byla také vypočteny testovací příklady pro testování funkčnosti softwaru. The program library for integrating the differential algebraic method in the EOD program was developed. The set of examples was computed which enables testing of the software. Keywords: electron optics; differential algebraic method Available at various institutes of the ASCR
SMV-2016-21: DA modul pro EOD

V rámci smluvního výzkumu byla vyvinuta softwarová knihovna, která umožňuje užití metody diferenciálních algeber v programu EOD. Byla také vypočteny testovací příklady pro testování funkčnosti ...

Radlička, Tomáš
Ústav přístrojové techniky, 2016

SMV-2016-04: Výzkum a vývoj vysokonapěťového zdroje 100 kV
Zobač, Martin; Vlček, Ivan
2016 - Czech
Náplní je pokračování vývoje vysokonapěťového zdroje urychlovacího napětí s integrovaným\nnízkonapěťovým zdrojem napájení plovoucí části a výroba prototypu tohoto zdroje. Zdroj primárního\nnapětí je určen pro aplikaci v litografii nebo pro TEM. \n The project deals with research and development of high voltage power supply for particle optics accelerator with integrated power supply for FEG. The supply is intended for electron lithography and for TEM. Keywords: high voltage; high tension; power supply; FEG; TEM; electron lithography Available at various institutes of the ASCR
SMV-2016-04: Výzkum a vývoj vysokonapěťového zdroje 100 kV

Náplní je pokračování vývoje vysokonapěťového zdroje urychlovacího napětí s integrovaným\nnízkonapěťovým zdrojem napájení plovoucí části a výroba prototypu tohoto zdroje. Zdroj primárního\nnapětí je ...

Zobač, Martin; Vlček, Ivan
Ústav přístrojové techniky, 2016

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